ASM International N.V. Announces High-Productivity Extension of Eagle® PECVD Platform

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Beleggingsadvies 05/12/2007 07:22
ASM International N.V. (Nasdaq: ASMI and Euronext Amsterdam: ASM) and its wholly-owned subsidiary ASM Japan K.K. today formally introduced the Eagle® XP, a high-productivity extension of the successful Eagle 12 PECVD (Plasma Enhanced Chemical Vapor Deposition) platform. While utilizing the same platform design of independent reactors on a central handler for maximum flexibility, the Eagle XP more than doubles the mechanical wafer handling throughput to a maximum of 180 wafers per hour. The new extension supports up to five process modules and includes several advanced features, such as dual end-effecter robots, cooling stages and new software concepts.
Because the Eagle XP continues to use the same proven reactor concepts, it enables a smooth transition for users of existing Eagle platforms and will be the platform of choice for all PECVD processes, including all Aurora® low-k related processes, conventional oxide and nitride process, and NCP(TM) (Nano Carbon Polymer) for advanced patterning applications.
ASM further reported that five platforms were delivered in the second half of 2007 to several major memory device manufacturers in Asia.
"The high productivity of this platform extension as measured in wafers per hour per capital investment or in wafers per hour per footprint area makes it the ideal workhorse for DRAM and NAND flash factories," commented Tominori Yoshida, PECVD Business Unit Manager. "In addition, due to the process transparency between the Eagle 12 and the Eagle XP, we expect fast acceptance in the marketplace."
"With its improved modular architecture, its flexibility and high productivity, this platform will be ASM's growth platform for many current, and future, low temperature single-wafer process applications," added Ivo Raaijmakers, Chief Technology Officer and Director of R&D of Front-end Operations.
ASM International N.V. also announced that it will hold an Eagle XP seminar on December 5, 2007 in conjunction with Semicon Japan. The seminar will be held in Room 1 at Hall 3 from 14:30 to 15:20. For further information, please visit the Semicon Japan website: www.semiconjapan.org.





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