ASM International N.V. today announced that it has sold the world's first 300 mm epitaxial reactor into mainland China. The system, shipped in Q4 2005, was ordered by the General Research Institute for Nonferrous Metals (GRINM), one of the largest Chinese research institutes for semiconductor related applications.

"Although initially used for 12 inch silicon epitaxial wafers, the Epsilon® 3200 system going into our Beijing facility was chosen specifically to expand into studies of silicon germanium (SiGe), strained silicon as well as other new research areas," said Dr. Hailing Tu, president of GRINM. "In addition, ASM's track record in providing state-of-the-art processing for some of the world's most advanced IC technologies weighed heavily in our selection process."

The main use of the Epsilon 3200 is for epitaxial growth of silicon and SiGe alloys. This includes advanced blanket and selective epitaxial growth processes for recessed and elevated source/drain structures as used in state-of-the-art CMOS transistors, as well as the integration of strained silicon in SOI wafer technology.

"ASM's presence in China's epitaxial market is well established with over 60 percent market share," said Dr. Armand Ferro, ASM's Epsilon Business Unit Manager. "The addition of GRINM to our customer base is a huge win for ASM and plays an important role in our China market strategy, especially since GRINM is engaged in a wide range of government funded, advanced scientific and engineering programs, and is capable of spinning off large commercial projects."

"With GRINM's adoption of the 300 mm Epsilon and development of advanced applications underway, ASM expects to continue penetration into China's 300 mm market and remain the main epitaxial equipment supplier for the region," concluded Dr. Ferro.

About GRINM
The General Research Institute for Nonferrous Metals (GRINM), founded in 1952, is the largest research institute in the nonferrous metals industry in China. The Institute, which employs over 2000 people is headquartered in Beijing and headed by Dr. Hailing Tu, a renowned semiconductor materials expert. GRINM's mission is to conduct basic and applied research to strengthen the competitive position of China's metals industry, materials science and engineering. The research institute has successfully completed more than 5000 projects, including 400 of national or international significance, and has won 800 national and ministerial awards.