ALMERE, THE NETHERLANDS, July 29, 2009 - ASM International N.V. (NASDAQ: ASMI and Euronext Amsterdam: ASM) reports today its second quarter 2009 (unaudited) operating results in accordance with US GAAP.
- Second quarter of 2009 net sales of EUR 119.5 million, up 34% from the first quarter of 2009 and down 43% from the second quarter of 2008. Front-end sales were down 40%, Back-end sales were up 112%;
- Restructuring expenses of EUR 15.4 million were incurred and an inventory impairment charge of EUR 20.6 million was recognized in the second quarter of 2009;
- Net loss (allocated to the shareholders of the parent) of the second quarter of 2009 was EUR 55.7 million, or EUR 1.08 diluted net loss per share, as compared to net loss of EUR 23.3 million, or EUR 0.45 diluted net loss per share for the first quarter of 2009 and net earnings of EUR 9.6 million or EUR 0.18 diluted net earnings per share for the second quarter of 2008;
- Bookings in the second quarter of 2009 were EUR 155.8 million, up 85% from the first quarter of 2009. Bookings from our Front-end segment were down 36% and bookings from our Back-end segment were up 167%. Quarter-end backlog was EUR 122.4 million, up 42% from the end of the previous quarter.

ASM Wins New ALD Business in Japan at Multiple High-K Logic Gate Manufacturers
ALMERE, THE NETHERLANDS, July 29, 2009 - ASM International N.V. (NASDAQ: ASMI and Euronext Amsterdam: ASM) (www.asm.com), today announced that it has sold its Pulsar® Atomic Layer Deposition (ALD) system for high-k gates to two top Japanese logic device manufacturers for insertion in the 32/28nm technology node. The tools will be used for hafnium-based high-k gate dielectrics, as well as for the dielectric capping layers used to tune work function of the gate stack. One customer also ordered ASM's EmerALD® process module for metal gates.

"These orders further extend our leadership position in delivering manufacturing solutions for high-k gates, having now shipped well over 100 Pulsar ALD tools," said Bob Hollands, Director of Marketing for Transistor Products at ASM. "The performance benefits of high-k films deposited in the Pulsar, and our customer-focused approach that enables process integration solutions, were key factors in gaining these new customers. With process integration knowledge for high-k gates growing, we are seeing the adoption of high-k metal gates now accelerate rapidly. The combination of Pulsar and EmerALD demonstrates the benefit of ASM's capability to deposit in a clustered system the high-k film, the dielectric capping layer and the metal electrode."