SHANGHAI, China, 21 June 2017 - Shanghai Integrated Circuit Research and Development Center Ltd. (ICRD), a public research consortium dedicated to the advancement of the semiconductor industry in China, and leading chip-making equipment manufacturer ASML Holding NV (ASML) signed a Memorandum of Understanding (MoU) to set up a jointly-owned world-class training center in Shanghai. Both parties also plan to explore other possible education-related collaboration models in the future.

ICRD and ASML intend to use existing ICRD cleanroom facilities and classrooms for the training center and equip it with lithography and metrology equipment provided by ASML. Experienced ASML lithography engineers will provide the training to ASML's customer support work force, as well as to our existing and potential customers in the Chinese IC industry. The engineers will be trained in operating the equipment, enhancing their skills through continuous and structured learning and knowledge management.

The planned location in Shanghai was chosen based on the proximity to the sites of IC manufacturers in China and the ease of travel to and from those locations, the expected cost of operation, the availability of local partners and the strong level of IC and general policy support.

"ICRD and ASML are jointly establishing a training center for lithography talent. The center will be equipped with lithography and metrology systems provided by ASML, and the training courses will be open to lithography engineers across the industry in China over time. It will significantly contribute to the development of the high-end, professional technical personnel in China's IC industry," Dr. Yuhang Zhao, Chairman and CEO of ICRD said.

"ASML is committed to deepening its engagement with the Chinese IC industry. With the expected rapid development of the IC industry in China, the demand for manufacturing equipment and a well-trained work force that can operate it will become stronger and stronger," said Peter Wennink, President and CEO of ASML. "The motivation for establishing this training center is to give ASML, our customers and our partners in the Chinese IC industry the opportunity to develop the skills and expertise of the lithography engineers that will be needed to succeed in China's burgeoning semiconductor market."

Officials from the Shanghai Municipal Government and business leaders from the IC industry witnessed the signing of the MoU between ICRD and ASML. The distinguished guests attending the ceremony included Xiaochun Lu, the Party Secretary of the Shanghai Municipal Commission of Economy and Informatization (SHEITC), Xinhua Fu, Deputy Director of the General Office at SHEITC, Suxin Zhang, Chairman of Hua Hong Group, and Haibo Lei, President of HLMC.

Hua Hong Group Chairman Suxin Zhang said: "Shanghai is the semiconductor foundation of the Chinese microelectronics industry and is planning to kick off construction of multiple fabs under the country's 13th Five-Year Plan. This has created a huge demand for equipment, process technology and especially technology personnel. I believe that this cooperation will help building a professional talent training center of global impact."

Xinhua Fu, Deputy Director of the General Office at SHEITC, said in his address: "The Shanghai municipal government is aggressively making ICRD a world-class technical and intellectual property resource provider to China's semiconductor industry. I believe today's MoU signing ceremony marks a good start to build a new model of win-win strategy and opens up a new prospect of utilizing of complementary advantages in an effort to accelerate the development of the Shanghai IC industry by talent cultivation."

Attending for ICDR were President Dr. Shoumian Chen and Vice President Bin Jiang. Attending for ASML were Peter Wennink, President and CEO, Sunny Stalnaker, Executive Vice President Sales and Customer Management, Mr. Young-Sun Kim, Country Manager of ASML China and Johnny Fan, Sales director of ASML China.